Ausschreibungen

The University of Cambridge, Department of Engineering provides modern laboratory accommodation and state of the art research facilities. The Department is particularly well equipped for nano-materials' processing. The existing facilities are in frequent use, most equipment being in use for minimum of 12 hours a day, 7 days a week. The new cleanroom nano-fabrication facility is under construction and will be completed in December 2016. Electron-beam lithography is 1 of the most essential techniques used in research and development of nano-scale devices. The electron-beam lithography system will contribute to the ongoing research effort within the University of Cambridge in developing the novel nano-electronic components, on-chip integrated optoelectronic circuits, quantum devices, 2d material related devices, photonic and plasmonic systems. It will allow the cutting-edge fabrication of small-scale (lab-level) devices and will expand the capabilities to a large-scale production. This will bridge the gap between the academic research, technology development and a wafer-scale production. The electron-beam lithography system will have multiple users across the University of Cambridge (Engineering, Physics, Material Science and Bioengineering Departments) and will also have to meet demands of users from industry and academia external to the University, under the umbrella of the Royce Institute.

UCAM 073/16 E-Beam and Optical Lithography Suite

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Ausschreibungen zum Thema Installation services of laboratory equipment