III-V ICP Etcher

DTU requires a ICP reactive ion etcher to etch III-V materials with a special focus on etching GaAs micropillar devices from a planar microcavity (“the Instrument”). The system is expected to be delivered as soon as possible but at the latest in Q3 2026. The Instrument is to be the core instrument for a research project on optical devices. Besides that, it will be part of the shared open access instruments at the facility supporting research in micro and nano fabrication within optical devices and quantum computer developments. Therefore, DTU need a state-of-the-art instrument that can meet all current and future needs for etching III-V materials like GaAs, AlGaAs, InGaAs, AlInGaAsP and InP .
CPV-Code: 38000000 51430000
Abgabefrist: 13.08.2025
Typ: ContractNotice
Status: None
Aufgabe: None
Vergabestelle:
name: Danmarks Tekniske Universitet - DTU
address: Anker Engelunds Vej 1 Kgs. Lyngby
postal_code: 2800
city: Kgs. Lyngby - DK
country: DK
email: aasst@dtu.dk
phone: +45 25230071
contact_point: Anna Storch +45 25230071 aasst@dtu.dk
idate: 25. Juni 2025 08:01
udate: 25. Juni 2025 08:01
doc:
authority_types:
activities:
Quelle: https://ted.europa.eu/de/notice/-/detail/00410886-2025
Unterlagen: https://eu.eu-supply.com/app/rfq/rwlentrance_s.asp?PID=434628&B=
Zuschlagskriterium: quality
Vertrag: None
Prozedur: None
Nuts: None
Veröffentlichung: 24.06.2025
Erfüllungsort: Kgs. Lyngby - DK
Link:
Lose:
Name Los Nr 1 None
Gewinner None
Datum
Wert None
Anzahl Angebote None