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Deposition Tools

- An ICP Plasma Etch system, with load lock, for etching III-V materials to shallow or standard (<10um) etch depths, and be capable of etching the following materials GaAs, GaN, InP, InSb/GaSb, SixNy, BCB and Polyimide - A High Density Plasma Etch system designed to etch strongly bonded materials, with load lock, capable of etching strongly bonded materials including SiO2 (>100um), Glass, SiNx,, SiC, GaN, PZT and AlN and Al2O3. Must operate with higher plasma density and at lower pressures than conventional ICP systems.

CPV-Code:

38000000

Abgabefrist:

Typ:

Contract award notice

Status:

Not applicable

Aufgabe:

Education

Vergabestelle:

name:	Cardiff University
address:	Procurement Services, McKenzie House, 30-36 Newport Road
postal_code:	CF24 0DE
city:	Cardiff - UK
country:	UK
email:	None
phone:	+44 2920879648
contact_point:
idate:	29. März 2022 10:21
udate:	29. März 2022 10:21
doc:	164655_2022.xml
authority_types:
activities:

Quelle:

https://ted.europa.eu/udl?uri=TED:NOTICE:164655-2022:TEXT:EN:HTML

Unterlagen:

None

Zuschlagskriterium:

The most economic tender

Vertrag:

Supplies

Prozedur:

Open procedure

Nuts:

None

Veröffentlichung:

29.03.2022

Erfüllungsort:

Cardiff -

Link:

Lose:

Name	Los Nr 1 None
Gewinner	SPTS Technologies Ltd
Datum
Wert	GB£1 666 666,00
Anzahl Angebote	1

Deposition Tools

Informiere dich täglich über neue Ausschreibungen zum Thema Laboratory, optical and precision equipments (excl. glasses)

Informiere dich täglich über neue
Ausschreibungen zum Thema Laboratory, optical and precision equipments (excl. glasses)