PECVD Plasma Deposition Tool

A new PECVD plasma deposition tool for use within the ICS cleanroom to deposit films of dielectric materials onto semiconductor samples, wafers and other substrates, ranging in size from 10 x 10 mm up to 200mm diameter wafers.
CPV-Code: 38000000
Abgabefrist:
Typ: Contract award notice
Status: Not applicable
Aufgabe: Education
Vergabestelle:
name: Cardiff University
address: Procurement Services, McKenzie House, 30-36 Newport Road
postal_code: CF24 0DE
city: Cardiff - UK
country: UK
email: None
phone: +44 2920879648
contact_point:
idate: 1. April 2022 08:31
udate: 1. April 2022 08:31
doc: 173066_2022.xml
authority_types:
activities:
Quelle: https://ted.europa.eu/udl?uri=TED:NOTICE:173066-2022:TEXT:EN:HTML
Unterlagen: None
Zuschlagskriterium: The most economic tender
Vertrag: Supplies
Prozedur: Open procedure
Nuts: None
Veröffentlichung: 01.04.2022
Erfüllungsort: Cardiff -
Link:
Lose:
Name Los Nr 1 None
Gewinner Oxford Instruments
Datum
Wert GB£259 975,00
Anzahl Angebote 1