Ausschreibungen

A gas cluster ion source is required for the sputtering of organic materials for 3D analysis using ToF SIMS in dual beam mode. The ion source must enhance the capabilities of an existing ToF SIMS IV (IONTOF GmbH) instrument and must be compatible with present hardware and software. A mandatory feature is that the gas cluster source has the capacity to preserve molecular information during sputtering thereby allowing depth profiling of materials such as polymers and biological samples. The gas cluster ion source should also be capable of operating in analysis mode to acquire spectral data which is essential. A sample rotation device is also an essential feature to allow the highest depth resolution during profiling using the gas cluster source. Again this must be compatible with the existing instrument. In order to test the functionality of a gas cluster system, standard polymer multi-layer samples (available from The National Physical laboratory (UK)) can be depth profiled to ensure the appropriate depth resolution, which should be in the order of less than 3 nm. Standard reference samples can also be analysed to ensure the appropriate spectral resolution from a system in analysis mode. An increased capacity for data processing and analysis would also be desirable.

Gas Cluster Ion Source (ITT/541)

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Ausschreibungen zum Thema Ion and molecular microscopes