The FhG ISIT plans to purchase a “Vertical LPCVD System” with 2 tubes or “2 Vertical LPCVD System". One for the deposition of TEOS and the other tube for the deposition of Ge and phosphor doped Si. New and used equipments are permitted. It should be a automated vertical furnace system designed for min. 100 process wafers with 200 mm diameter. The exhaust vent line for process gas must be connectable to exhaust gas treatment equipment (e.g. scrubber).
| CPV-Code: |
34999300
|
| Abgabefrist: |
02.01.2019 |
| Typ: |
Contract notice |
| Status: |
Submission for all lots |
| Aufgabe: |
Other |
| Vergabestelle: |
| name: |
Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. über Vergabeportal deutsche eVergabe |
| address: |
Hansastr. 27c |
| postal_code: |
80686 |
| city: |
München - DE |
| country: |
DE |
| email: |
None |
| phone: |
None |
| contact_point: |
|
| idate: |
12. Juni 2020 23:49 |
| udate: |
12. Juni 2020 23:49 |
| doc: |
523532_2018.xml |
| authority_types: |
|
| activities: |
|
|
| Quelle: |
http://ted.europa.eu/udl?uri=TED:NOTICE:523532-2018:TEXT:EN:HTML |
| Unterlagen: |
None |
| Zuschlagskriterium: |
The most economic tender |
| Vertrag: |
Supplies |
| Prozedur: |
Competitive procedure with negotiation |
| Nuts: |
None |
| Veröffentlichung: |
28.11.2018 |
| Erfüllungsort: |
München - DE |
| Link: |
|
| Lose: |
| Name |
Los Nr 1 Germany__München__Maschinen für die Galvanotechnik |
| Gewinner |
None |
| Datum |
|
| Wert |
None |
| Anzahl Angebote |
None |
|